Shanghai, China: Huawei chip breakthrough plans target transistor density equivalent to 1.4-nanometre processes by 2031, as the company seeks a path around U.S. sanctions.
Huawei Technologies unveiled the strategy at a semiconductor symposium in Shanghai. The company did not provide independent performance data for the 1.4-nm claim.
The Chinese company calls its approach the Tau Scaling Law. Huawei said the method improves chip performance by reducing signal and data movement time across circuits, chips and computing systems.
He Hui, director of semiconductor research at Omdia, told Reuters that Huawei was shifting from node-driven scaling to system-level efficiency. He said the approach could extract performance when advanced lithography remains restricted.
Huawei said Kirin smartphone chips due later this year will first use a Tau-based architecture called LogicFolding. The company said the design shortens wiring inside chips and improves performance.
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TSMC currently uses 2-nm technology and plans 1.4-nm mass production in 2028. Huawei said it has mass-produced 381 chips based on the Tau approach over six years.
